Electron beam exposure apparatus, electron beam method,...

Details Electron beam exposure apparatus, electron beam method,... Electron beam exposure apparatus, electron beam method,...

2005-06-07

2005-06-07

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S492200, C250S492220

Reexamination Certificate

active

06903355

ABSTRACT:
An electron beam exposure apparatus for exposing a pattern accurately even if the current of the electron beam is high. The electron beam exposure apparatus100includes a mask30with a first and second block patterns for shaping the electron beam. Magnification of the first block pattern to a first exposure pattern which is to be exposed by the electron beam having a first current shaped by the first block pattern is different with magnification of the second block pattern to a second exposure pattern which is to be exposed by the electron beam having a second current shaped by the second block pattern.

REFERENCES:
patent: 5557314 (1996-09-01), Okamoto et al.
patent: 6225637 (2001-05-01), Terashima et al.
patent: 6624430 (2003-09-01), Higuchi
patent: 6627905 (2003-09-01), Hirayanagi

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