Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-04-07
2008-11-11
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492200, C250S492100, C250S492230, C250S492300, C716S030000, C716S030000, C430S296000
Reexamination Certificate
active
07449700
ABSTRACT:
An electron beam exposure apparatus has a first shaping aperture having a plurality of rectangular openings, each having sizes different from each other and shaping a beam shape of an electron beam, a rectangular opening selection deflector which controls a path of the electron beam to irradiate the electron beam on one of the plurality of rectangular openings, a second shaping aperture having a plurality of character openings, each having sizes different from each other and shaping a beam shape of the electron beam passing through the first shaping aperture, and a character beam deflector which controls the path of the electron beam to irradiate the electron beam on character openings corresponding to the rectangular openings in the first shaping aperture.
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Berman Jack I.
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Logie Michael J
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