Electron beam exposure apparatus and semiconductor device...

Details Electron beam exposure apparatus and semiconductor device... Electron beam exposure apparatus and semiconductor device...

2005-08-16

2005-08-16

Rutledge, D. (Department: 2851)

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C355S067000, C250S491100, C250S492200, C310S010000, C310S012060

Reexamination Certificate

active

06930756

ABSTRACT:
An electron beam exposure apparatus which exposes a substrate with a predetermined pattern using one or a plurality of electron beams. The apparatus includes a substrate stage on which a substrate is mounted, a transfer stage which drives the substrate stage on an X-Y plane, an electromagnetic actuator which drives the substrate stage in a rotation direction about a Z-axis with respect to the transfer stage, and a measuring system which measures a position of the substrate stage in the rotation direction about the Z-axis using a measuring beam along a direction perpendicular to the plurality of electron beams.

REFERENCES:
patent: 5717482 (1998-02-01), Akutsu et al.
patent: 5858587 (1999-01-01), Yamane et al.
patent: 5864142 (1999-01-01), Muraki et al.
patent: 6054713 (2000-04-01), Miyake et al.
patent: 6392243 (2002-05-01), Muraki
patent: 5-89815 (1993-04-01), None
patent: 9-330867 (1997-12-01), None

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