Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-06-11
1999-05-18
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
25049223, H01J37/302
Patent
active
059052678
ABSTRACT:
A multi-electronic beam electron beam exposure apparatus in which the patterns exposed by electron beams can be connected with a high degree of reliability. An electron beam exposure method includes steps of causing a plurality of electron beams to impinge upon a substrate at positions that differ from one another, deflecting each electron beam in an element exposure area of each electron beam, wherein the element exposure area is decided by a deflector of the electron beams, and individually controlling irradiation of the substrate by the electron beams, whereby a pattern is exposed in a plurality of the element exposure areas on the substrate. The method further includes a step of controlling the plurality of electron beams by the deflector in such a manner that exposure areas overlap at portions where the element exposure areas are contiguous.
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Berman Jack I.
Canon Kabushiki Kaisha
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