Electron beam exposure apparatus and method of controlling same

Details Electron beam exposure apparatus and method of controlling same Electron beam exposure apparatus and method of controlling same

1997-06-11

1999-01-26

Nguyen, Kiet T.

Radiant energy

Means to align or position an object relative to a source or...

H01J 37304

Patent

active

058641424

ABSTRACT:
A beam coordinate system decided by a plurality of beam reference positions and a deflection coordinate system decided by a deflector in a multi-electron beam exposure apparatus are made to coincide in a highly precise fashion and exposure is performed upon rapidly correcting a change in the offset between the two coordinate systems with the passage of time. The apparatus has an adjusting unit for adjusting an XY stage or a deflector based upon a first parameter representing the relationship between the beam coordinate system, which is decided by the plurality of beam reference positions, and the design coordinate system, and a second parameter representing the relationship between the deflection coordinate system, which is decided by the deflector, and the design coordinate system.

REFERENCES:
patent: 4130761 (1978-12-01), Matsuda
patent: 4724328 (1988-02-01), Lischke
patent: 4812662 (1989-03-01), Goto et al.
patent: 4980567 (1990-12-01), Yasuda et al.
patent: 5422491 (1995-06-01), Sakamoto

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