Electron beam exposure apparatus and method, and device manufact

Details Electron beam exposure apparatus and method, and device manufact Electron beam exposure apparatus and method, and device manufact

1997-03-04

1998-11-10

Anderson, Bruce

Radiant energy

With charged particle beam deflection or focussing

With target means

250396R, H01J 3712

Patent

active

058347836

ABSTRACT:
An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throughput. An electron beam exposure apparatus having a source for emitting an electron beam and a reduction electron optical system for reducing and projecting, on a target exposure surface, an image of the source, includes a correction electron optical system which is arranged between the source and the reduction electron optical system to form a plurality of intermediate images of the source along a direction perpendicular to the optical axis of the reduction electron optical system, and corrects in advance aberrations generated when the intermediate images are reduced and projected on the target exposure surface by the reduction electron optical system.

REFERENCES:
patent: 4130761 (1978-12-01), Matsuda
patent: 4142132 (1979-02-01), Harte
patent: 4200794 (1980-04-01), Newberry
patent: 4338548 (1982-07-01), Bono et al.
patent: 4472636 (1984-09-01), Hahn
patent: 4498010 (1985-02-01), Biechler
patent: 4724328 (1988-02-01), Lischke
patent: 4980567 (1990-12-01), Yasuda et al.
patent: 5027043 (1991-06-01), Chen et al.

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