Electron-beam exposure apparatus and method

Details Electron-beam exposure apparatus and method Electron-beam exposure apparatus and method

1998-05-28

2000-08-15

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504922, H01J 37302

Patent

active

061040355

ABSTRACT:
A multi electron-beam exposure apparatus which deflects a plurality of electron beams on an exposed surface, and upon each deflection, respectively controls irradiation of the respective electron beams. The apparatus writes a pattern by sequentially writing pattern parts of the pattern on subfields each composed of a plurality of elementary exposure fields, by simultaneously writing patterns on the respective elementary exposure fields. Pattern data of the pattern written on the exposed surface is divided in units of subfields, and as a control method for exposure of each subfield, a first control method to deflect the plurality of electron beams by a predetermined deflection width and set the electron beams, or a second control method to deflect the plurality of electron beams without setting the electron beams at positions where all the electron beams are cut off, is selected based on the divided pattern data for the subfield.

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