Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1999-05-17
2000-12-26
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
25049222, 25049223, G21K 510
Patent
active
061663875
ABSTRACT:
An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throughput. An electron beam exposure apparatus having a source for emitting an electron beam and a reduction electron optical system for reducing and projecting, on a target exposure surface, an image of the source, includes a correction electron optical system which is arranged between the source and the reduction electron optical system to form a plurality of intermediate images of the source along a direction perpendicular to the optical axis of the reduction electron optical system, and corrects in advance aberrations generated when the intermediate images are reduced and projected on the target exposure surface by the reduction electron optical system.
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Gotoh Susumu
Muraki Masato
Anderson Bruce C.
Canon Kabushiki Kaisha
Wells Nikita
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