Electron beam exposure apparatus and electron beam...

Details Electron beam exposure apparatus and electron beam... Electron beam exposure apparatus and electron beam...

2006-04-25

2006-04-25

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S397000

Reexamination Certificate

active

07034321

ABSTRACT:
An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting a current of the electron beam; and a storage unit, provided on the wafer stage, for storing information indicating the current detected by the current detector.

REFERENCES:
patent: 5528048 (1996-06-01), Oae et al.
patent: 6946665 (2005-09-01), Muraki et al.
patent: 6969862 (2005-11-01), Muraki et al.
patent: 10-270535 (1998-10-01), None
patent: 11-214482 (1999-08-01), None

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