Electron beam exposure apparatus and electron beam...

Details Electron beam exposure apparatus and electron beam... Electron beam exposure apparatus and electron beam...

2006-05-09

2006-05-09

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492220, C250S492230

Reexamination Certificate

active

07041988

ABSTRACT:
An electron beam exposure apparatus for exposing wafer with an electron beam, includes: a first electromagnetic lens system for making the electron beam incident substantially perpendicularly on a first plane be incident on a second plane substantially perpendicularly; a second electromagnetic lens system for making the electron beam that was substantially perpendicularly incident on the second plane be incident on the wafer substantially perpendicularly; a rotation correction lens provided within the first electromagnetic lens system for correcting rotation of the electron beam caused by at least the first electromagnetic lens system; a deflection system for deflecting the electron beam to a position on the wafer; and a deflection-correction optical system provided within the second electromagnetic lens system for correcting deflection aberration caused by the deflection system.

REFERENCES:
patent: 6630681 (2003-10-01), Kojima
patent: 6703630 (2004-03-01), Kurokawa
patent: 09-245708 (1997-09-01), None
patent: 11-176737 (1999-07-01), None
patent: 2001-267221 (2001-09-01), None

Affiliated with

Also associated with

Rating

Electron beam exposure apparatus and electron beam... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam exposure apparatus and electron beam..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam exposure apparatus and electron beam... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3605129