Electron beam exposure apparatus and a method for electron beam

Details Electron beam exposure apparatus and a method for electron beam Electron beam exposure apparatus and a method for electron beam

1994-09-06

1997-07-01

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

H01J 37302

Patent

active

056441380

ABSTRACT:
An electron beam exposure apparatus comprising: exposure computing means for outputting main-exposure data and sub-exposure data, the former of which expose non-reversal image area of a depiction pattern, the other of which expose reversal image area of the depiction pattern respectively; and electron beam optics means for emitting electron beams and deflecting thereof onto workpiece to be exposed according to the main exposure data and sub-exposure data from the exposure computing means.

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