Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1981-07-30

1984-02-21

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With detector

2504911, 219121EY, G01K 108, B23K 1500

Patent

active

044332432

ABSTRACT:
With the invention an electron beam scans reference marks formed on a sample so as to determine the positions of the reference marks. The sample is scanned by the electron beam with respect to the positions of the reference marks thereby to form a desired pattern on the sample. The accelerating voltage for the electron beam is changed to a lower value upon scanning the sample for generation of a pattern than upon scanning the reference marks.

REFERENCES:
patent: 3308264 (1967-03-01), Ullery
patent: 3413517 (1968-11-01), Barber et al.
patent: 3513285 (1970-05-01), Imura
patent: 4317981 (1982-03-01), Chubarou

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