Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1983-12-28

1986-08-19

Ruggiero, Joseph

Boots, shoes, and leggings

250398, 2504922, 364490, 364571, G06F 1546, H01J 37304

Patent

active

046073337

ABSTRACT:
An electron beam exposure apparatus includes an electromagnetic-type deflector for deflecting an electron beam in accordance with an analog signal corresponding to a digital signal which specifies an exposure region of a sample and an electrostatic-type deflector for deflecting the electron beam to a desired position in the exposure region. A difference signal representing the difference between the analog signal and a reference analog signal corresponding to the digital signal is taken out for compensating the amount of deflection of the electron beam in the electrostatic-type deflector.

REFERENCES:
patent: 4362942 (1982-12-01), Yasuda
patent: 4363953 (1982-12-01), Katsuta et al.
patent: 4413187 (1983-11-01), Akazawa et al.
patent: 4430571 (1984-02-01), Smith et al.
patent: 4443703 (1984-04-01), Shimazu et al.
patent: 4469950 (1984-09-01), Taylor et al.
patent: 4494004 (1985-01-01), Mauer, IV et al.

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