Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1977-08-01

1979-03-20

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396ML, A61K 2702, G21K 108

Patent

active

041456157

ABSTRACT:
An electron beam exposure apparatus includes an electron beam emitting system having a means for varying the width of an electron beam. In this apparatus a plurality of identical pattern portions corresponding to a plurality of minimum width scanning lines are scanned one at a time, by an electron beam of a width corresponding to the number of repetitions of the minimum width scanning lines, according to the repetition information of the minimum width scanning lines of the electron beam.

REFERENCES:
patent: 3257555 (1966-06-01), Klebba
patent: 3914608 (1975-10-01), Malmberg
patent: 4063103 (1977-12-01), Sumi

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