Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1991-02-21

1992-01-21

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37304

Patent

active

050830325

ABSTRACT:
Stored in the magnetic disk are the lithography data for lithographing a mask pattern and the correction data for correcting the lithography data. The CPU reads the lithography data and correction data from the magnetic disk and compares addresses from the different sources. When the two separate addresses coincide, the electro-optic system lithographs the mask pattern based on the correction data, whereas when the two addresses disagree with each other, it lithographs the mask pattern according to the lithography data.

REFERENCES:
patent: Re33193 (1990-04-01), Yamaguchi et al.
patent: 4678919 (1987-07-01), Sugishima et al.
patent: 4879473 (1989-11-01), Zumoto et al.

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