Electron beam exposure apparatus

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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Details

250311, 250492A, G21K 108

Patent

active

041514173

ABSTRACT:
An electron beam exposure apparatus comprises a pair of electrostatic deflecting plates so disposed that the center thereof in the direction of an advancing electron beam emitted from an electron gun is located on the crossover point of said beam, a variable voltage source for said deflecting plates and an aperture disposed in the path of the deflected electron beam.

REFERENCES:
patent: 3857041 (1974-12-01), Spicer
patent: 3876883 (1975-04-01), Broers

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