Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1978-06-15

1980-08-19

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250492R, A61K 2702

Patent

active

042186218

ABSTRACT:
Disclosed is an electron beam exposure apparatus which comprises a first deflection system for deflecting an electron beam emitted from an electron gun and an objective electron lens for converging the deflected electron beam to apply the beam to a workpiece. Interposed between the objective lens and the workpiece is a second deflection system for deflecting the electron beam in parallel with the optical axis of the apparatus.

REFERENCES:
patent: 3491236 (1970-01-01), Newberry
patent: 3876883 (1975-04-01), Broers
patent: 4117339 (1978-09-01), Wolfe
"Design & Optimization of Magnetic Lenses . . . " by E. Munro, Journal of Vacuum Science Tech., vol. 12, No. 6, Nov./Dec., 1975, pp. 1146-1150.

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