Electron-beam exposure apparatus

Details Electron-beam exposure apparatus Electron-beam exposure apparatus

1990-11-21

1992-10-06

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3730

Patent

active

051534410

ABSTRACT:
An electron-beam exposure apparatus includes a sample stage for holding a sample, an electron gun, a first aperture for shaping an electron beam emitted from the electron gun, an electro-optical device for causing an electron beam formed by the first aperture to be deflected and to be converged on a sample held on the sample stage, a second aperture in which a plurality of block patterns are formed, for shaping an electron beam from an electro-optical device, and a movement device for moving the second aperture in order to cause an electron beam from the electro-optical device to strike a desired block pattern among a plurality of the block patterns.

REFERENCES:
patent: 3118050 (1964-01-01), Hetherington
patent: 4119854 (1978-10-01), Tanaka et al.
patent: 4213053 (1980-07-01), Pfeiffer
patent: 4899060 (1990-02-01), Lischke
patent: 5036209 (1991-07-01), Kataoka et al.

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