Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1983-12-08

1985-06-11

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

H01J 3700

Patent

active

045230986

ABSTRACT:
An electron beam exposure apparatus designed to expose the surface of an electron sensitive photo-mask or the like in response to exposure patterns is provided. The pattern to be exposed is divided into stripe areas whose width in the beam scanning direction is determined in such a way that as many stripe areas as possible have the same pattern. The width of each such stripe area is stored in memory to permit successive exposure of each stripe area.

REFERENCES:
patent: 4132898 (1979-01-01), Buelow et al.
patent: 4267456 (1981-05-01), Hidai et al.
patent: 4363953 (1982-12-01), Katsuta et al.
patent: 4393312 (1983-07-01), Collier et al.

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