Electron-beam exposure apparatus

Details Electron-beam exposure apparatus Electron-beam exposure apparatus

1988-09-23

1989-11-07

Howell, Janice A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504923, 250310, 250396R, 36457104, H01J 3700

Patent

active

048794732

ABSTRACT:
An electron-beam exposure apparatus having a correction function for correcting deflection distortion. The correction function is carried out by the provision of a correcting device including an analog correction unit 35 and a digital correction unit having a memory unit 10 for storing correction data other than data that can be expressed by a cubic function. The capacity of such a memory unit can be made smaller than that of conventional apparatuses.

REFERENCES:
patent: 4420691 (1983-12-01), Zasio
patent: 4583298 (1986-04-01), Raugh
patent: 4593200 (1986-06-01), McGuire, III
patent: 4607333 (1986-08-01), Yasutake et al.
patent: 4692579 (1987-09-01), Saitou et al.
patent: 4763004 (1988-08-01), Yasuda et al.
Asai et al, "Distortion Correction and Deflection Calibration by Means of Laser Interferometry in an Electron-beam Exposure System," J. Vac. Sci. Technol., 16(6) Nov./Dec. 1979, pp. 1710-1714.

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