Electron beam exposing method and electron beam apparatus

Details Electron beam exposing method and electron beam apparatus Electron beam exposing method and electron beam apparatus

1978-12-19

1980-04-22

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250358, 219121EB, H01J 3700

Patent

active

041996895

ABSTRACT:
The diameter of an electron beam at a crossover point can be set to a predetermined value by adjusting a heater current through a heater of an electron gun and a voltage between an emitter of the electron gun and wehnelt electrode. The diameter of the electron beam incident onto an object to be exposed can be varied by varying the diameter of the electron beam at the crossover point. This can be done without adjusting an electron beam lens and deflection electrode of an electron beam exposing apparatus. The diameter of the electron beam incident onto an object to be exposed can be set to a predetermined value dependent upon a pattern to be described.

REFERENCES:
patent: 2860251 (1958-11-01), Pakswer et al.
patent: 3956635 (1976-05-01), Chang
patent: 4013891 (1977-03-01), Ko et al.
"Characteristics of the Hot Cathode Electron Microscope Gun," British Journal of App. Physics, Haime et al., vol. 3, pp. 40-46, Feb. 1952.
"Emission Characteristics of Lab. Electron Gun," Stichel et al., American Vacuum Society, Proc. 12th Symp. Electron Ion Laser Beam Technol., A15-A18, 1973.

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