Electron beam exposing apparatus with a stencil mask kept at a c

Details Electron beam exposing apparatus with a stencil mask kept at a c Electron beam exposing apparatus with a stencil mask kept at a c

1993-04-09

1995-06-27

Evans, Geoffrey S.

Electric heating

Metal heating

By arc

21912162, 2504923, H01J 37302, H01L 21426

Patent

active

054282039

ABSTRACT:
An electron beam exposing apparatus permitting the temperature of mask to be constant without affecting an electron beam. Keeping the temperature of a stencil mask 81 constant permits the position and form of an opening 69 to be constant. The temperature of a stencil mask 81 is measured by a thermal radiation to temperature transducer 72, and the magnitude of the output of a laser generator 89 is controlled by a control portion 70 based on the temperature data. A magnetic field affecting the flow of the electron beam 79 is not generated by emitting a laser beam 93.

REFERENCES:
patent: 5177365 (1993-01-01), Yamada

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