Electron beam exposing apparatus

Details Electron beam exposing apparatus Electron beam exposing apparatus

1979-01-22

1981-03-24

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250492R, A61K 2702

Patent

active

042582652

ABSTRACT:
Electron beam exposing apparatus includes first and second apertures to pass an electron beam and, a deflection device to change the incident position of the electron beam onto the second aperture to control a projected pattern configuration.

REFERENCES:
patent: 3876883 (1975-04-01), Broers
patent: 4145597 (1979-03-01), Yasuda
"New Imaging & Deflection"-by Pfeiffer, Journal of Vacuum Science Technology, vol. 12. No. 6, Nov./Dec. 1975, pp. 1170-1173.
"Automatic Stabilization of an Electron Probe"-by Doran et al. Journal Vacuum Science Technology, vol. 12, No. 6, Nov./Dec. 75, pp. 1174-1176.

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