Electron beam exposing apparatus

Details Electron beam exposing apparatus Electron beam exposing apparatus

1980-12-04

1984-02-07

Anderson, Bruce C.

Radiant energy

Ion generation

Field ionization type

313336, 250396R, H01J 116

Patent

active

044305702

ABSTRACT:
A variable shaping type electron beam exposing apparatus is provided which comprises an electron gun which irradiates an electron beam from the front end of a cathode chip; shaping plates having openings of variable shapes for shaping the electron beam irradiated from the electron gun into the shapes of these openings; and an objective lens for focusing the electron beam passed through the shaping plates into a predetermined shape on a sample. In this apparatus, the cathode chip is made of single-crystal lanthanum hexaboride whose axial orientation is <310>, the front end of it is formed into a circular conical shape, and half the vertical angle of the front end is set to be between 60.degree. and 85.degree.. The maximum area of the image on the sample is between 2 to 50 .mu.m.sup.2.

REFERENCES:
patent: 4054946 (1977-11-01), Duncan
patent: 4055780 (1977-10-01), Kawai et al.
patent: 4137476 (1979-01-01), Ishii et al.
patent: 4182958 (1980-01-01), Goto et al.
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patent: 4243866 (1981-01-01), Pfeiffer et al.
patent: 4258283 (1981-03-01), Brunger et al.
patent: 4346325 (1982-08-01), Nakasuji et al.
IEEE TRANSACTIONS ON ELECTRON DEVICES, vol. ED-26, No. 4, Apr. 1979, NY, PFEIFFER: "Recent Advances in Electron-Beam Lithography for the High-Volume Production of VLSI Devices", pp. 663-674.

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