Electron beam duplication lithography method and apparatus

Details Electron beam duplication lithography method and apparatus Electron beam duplication lithography method and apparatus

2005-02-01

2005-02-01

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S492210, C250S398000, C313S309000, C445S050000

Reexamination Certificate

active

06849856

ABSTRACT:
An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.

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patent: 5743998 (1998-04-01), Park
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