Electron beam drawing method

Details Electron beam drawing method Electron beam drawing method

1988-04-07

1989-08-01

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

2504922, 356401, H01J 37304

Patent

active

048535494

ABSTRACT:
The invention relates to an electron beam drawing method by a matching mark detecting method for use in manufacturing of semiconductor devices. First, the surface of a semiconductor wafer is divided into a number of blocks. Each block is divided into a number of chips. Four matching marks are formed at four corners of the block. Next, the matching marks are detected by an electron beam. When the electron beam deflecting system is corrected on the basis of the position information of the detected matching marks, different correcting equations are used in correspondence to the number of matching marks detected.

REFERENCES:
Davis et al., IBM Journal of Research and Development, Nov. 1977, pp. 498-505.

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