Electron beam drawing apparatus, deflection amplifier,...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492100, C250S492200, C250S492220

Reexamination Certificate

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07985958

ABSTRACT:
According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.

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Notice of Reasons for Rejection dated Feb. 22, 2010, from the Japanese Patent Office in corresponding Japanese application No. 2004-325503.

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