Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1988-07-29
1989-09-26
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 37302
Patent
active
048702862
ABSTRACT:
An electron beam direct drawing device for use in manufacturing a printed circuit board having a photoresist thereon according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprises means for dividing the drawing pattern information over a whole area of the printed circuit board into a plurality of fields each capable of being scanned by electron beam and for re-editing drawing patterns of the respective fields, means for storing the divided and then re-edited drawing pattern information, means for generating a first control signal for reading out the stored drawing pattern information sequentially and performing a main deflection of electron beam by means of a main deflector and means for generating a second control signal for deriving, from the stored drawing pattern information, information assigning an orientation of a pattern to be drawn and a scan width of a sub-deflection and for performing a predetermined sub-deflection scanning by means of a sub-deflector, whereby electron beam scans the printed circuit board under a control of a combination of the main deflection and the sub-deflection. A clock generator capable of producing a plurality of clock signals each corresponding to a specific line width of the pattern is provided to expose the line with electron beam of optimum dose.
REFERENCES:
patent: 4692579 (1987-09-01), Saitou et al.
Berman Jack I.
Mitsubishi Denki & Kabushiki Kaisha
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