Electron beam deflecting apparatus with reduced settling time pe

Details Electron beam deflecting apparatus with reduced settling time pe Electron beam deflecting apparatus with reduced settling time pe

1994-10-19

1996-06-25

Anderson, Bruce C.

Radiant energy

Invisible radiant energy responsive electric signalling

Flow metering

250356MC, 2504922, H01J 3710, H01J 37147

Patent

active

055302505

ABSTRACT:
In an electron beam deflecting apparatus including an electromagnetic deflection unit and a driver for driving the electromagnetic deflection unit in accordance with a main deflection amount, when a current main deflection amount is different from a previous main deflection amount, a corrected main deflection amount, which is an opposite value of the previous main deflection amount with respect to the current main deflection amount, is calculated as the main deflection amount.

REFERENCES:
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patent: 5134300 (1992-07-01), Kai et al.
patent: 5180920 (1993-01-01), Kai et al.
patent: 5225684 (1993-07-01), Taki et al.
patent: 5404018 (1995-04-01), Yasuda et al.
Y. Takahashi et al., "Electron beam lithography system with new correction techniques", J. Vac. Sci. Technol. B, vol. 10, No. 6, Nov./Dec. 1992, pp. 2794-2798.

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