Electron beam column generator for the fabrication of semiconduc

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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250398, H01J 3700

Patent

active

040840956

ABSTRACT:
This disclosure relates to an electron beam generator and focusing mechanism including a high current thermionic field emission source to establish a high current electron beam and an electro-magnetic focusing means placed along the axis of the electron beam between the source and the target so as to provide a large image focal distance with the electron beam source being formed of a tungsten cathode which is coated with zirconium.

REFERENCES:
patent: 3270243 (1966-08-01), Kerst
patent: 3648048 (1972-03-01), Cahan et al.
patent: 3699334 (1972-10-01), Cohen et al.
patent: 3872305 (1975-03-01), Koike

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