Electron beam blanker

Radiant energy – Radiation controlling means

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Details

250396R, 250398, H01J 3709

Patent

active

044450419

ABSTRACT:
An electron beam blanker for use in electron beam lithography systems is disclosed which is capable of providing exposure rates on the order of 300MHz at beam currents of approximately 600nA. A condensing lens and a stigmator are provided to bring the electron beam to a small image in a plane perpendicular to the beam direction. An etched silicon knife-edge, coated with gold, is located in this image plane in close proximity to the beam, to provide a sharp cut-off as the beam is swept past its edge. In accordance with aspects of the invention, a deflector plate structure provides an electromagnetic field whose geometry ensures that the velocity of a beam electron, as it exits the field, is substantially directly proportional to the undeflected beam electron's position vector relative to the beam cross-over in the image plane of the condenser lens. Since the image plane of the condensing lens becomes the object plane for a final lens which forms the spot on a point on the resist, the above geometry substantially eliminates spot motion during the blanker rise time.

REFERENCES:
patent: 3150257 (1964-09-01), Wilska
patent: 4153843 (1979-05-01), Pease

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