Electron beam apparatus with aberration corrector

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Reexamination Certificate

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C250S3960ML, C250S310000, C250S311000

Reexamination Certificate

active

06982427

ABSTRACT:
An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

REFERENCES:
patent: 3952198 (1976-04-01), Harada et al.
patent: 2003/0098415 (2003-05-01), Matsuya et al.
patent: 2000-195453 (1998-12-01), None
J. Zach, “Design of a High-Resolution Low-Voltage Scanning Electron Microscope”, Optik vol. 83, No. 1 (1989), pp. 30-40.
Joachim Zach and Maximilian Haider, “Aberration Correction in a Low Voltage SEM by a Multipole Corrector”, Nuclear Instruments and Methods in Physics Research , A 363 (1995), pp. 316-325.

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