Electron beam apparatus

Details Electron beam apparatus Electron beam apparatus

1988-02-16

1989-08-08

Eisenzopf, Reinhard J.

Electricity: measuring and testing

Measuring, testing, or sensing electricity, per se

With rotor

324158F, 324158P, G01R 106, G01R 1067

Patent

active

048556734

ABSTRACT:
In an electron beam apparatus in which an electron beam is irradiated on a specimen, secondary electrons are generated from the specimen under the bombardment of the electron beam, and voltage is applied to and a signal voltage is picked up from the specimen through a probe, a metal electrode is disposed on at least part of the outer peripheral surface of the probe through an insulator and the metal electrode is maintained at predetermined electrical potential. The secondary electrons can be shielded from a horizontal electric field generated from the probe and can be detected accurately by means of a detector.

REFERENCES:
patent: 3736541 (1973-05-01), Gould
patent: 3992073 (1976-11-01), Buchoff et al.
patent: 4116523 (1978-09-01), Coberly et al.
patent: 4532423 (1985-07-01), Tojo et al.
patent: 4697143 (1987-09-01), Lockwood et al.
patent: 4740746 (1988-04-01), Pollock et al.
"Character of Secondary Electron Spectrometer Designed for Wafer Probing" by Uchida et al, Japan Soc. for Prom. of Sci., Applic. of Changed Part. Beam to Industry, #132 Committee, #97 research conf. Reports, pp. 108-111.

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