Electron beam apparatus

Details Electron beam apparatus Electron beam apparatus

2006-01-13

2008-09-23

Santiago, Mariceli (Department: 2879)

Electric lamp and discharge devices

Stand-by electrode type

C313S313000, C313S314000, C313S237000, C313S495000, C313S311000

Reexamination Certificate

active

07427826

ABSTRACT:
There provided is an electron beam apparatus of preventing surface creeping discharge from newly arising due to discharge that arises between an anode electrode and an electron-emitting device. In an electron-emitting device including a scan signal device electrode and an information signal device electrode, a portion of the scan signal device electrode is covered by an insulating layer of insulating scan signal wiring from information signal wiring, an additional electrode is connected to the scan signal device electrode at an end portion of the insulating layer and the additional electrode is configured so that energy Ee being lost due to melting of the additional electrode is larger than energy Ea of discharge current flowing in to the electron-emitting device.

REFERENCES:
patent: 5839363 (1998-11-01), Yanagisawa et al.
patent: 6137218 (2000-10-01), Kaneko et al.
patent: 6703791 (2004-03-01), Azuma
patent: 6853128 (2005-02-01), Hachisu
patent: 6972203 (2005-12-01), Azuma
patent: 7067236 (2006-06-01), Yamada et al.
patent: 7097530 (2006-08-01), Katakura et al.
patent: 7151005 (2006-12-01), Azuma
patent: 7301268 (2007-11-01), Kang et al.
patent: 2003/0062843 (2003-04-01), Katakura et al.
patent: 2006/0063459 (2006-03-01), Iba et al.
patent: 2006/0087219 (2006-04-01), Taniguchi et al.
patent: 2006/0087220 (2006-04-01), Hiroki et al.
patent: 2007/0020787 (2007-01-01), Azuma
patent: 2007/0046173 (2007-03-01), Azuma et al.
Takuma, T., “Electric Field Concentration in Composite Dielectrics”, Journal of Electrostatic Japan, vol. 14, No. 1, pp. 40-48 (1990) and English Translation (pp. 1-22).

Affiliated with

Also associated with

Rating

Electron beam apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3992240