Electron beam antistatic method using conductive pins for charge

Details Electron beam antistatic method using conductive pins for charge Electron beam antistatic method using conductive pins for charge

1998-08-24

2000-11-14

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430942, G03F 900

Patent

active

061467944

ABSTRACT:
In an antistatic method for a photomask including a conductive optical shield layer, at least two conductive pins are inserted into the photomask, so that the conductive pins are in contact with the conductive optical shield layer. Then, the photomask is set in a cassette of an electron beam exposure apparatus. Then, the conductive pins are electrically connected to the cassette by conductive plates. Thus, electrons charged at the conductive optical shield layer by electron beams are effectively discharged from the conductive pins to the cassette.

REFERENCES:
patent: 5357396 (1994-10-01), Alm
patent: 5400209 (1995-03-01), Moslehi

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