Electron beam annealing of metal step coverage

Details Electron beam annealing of metal step coverage Electron beam annealing of metal step coverage

1980-07-17

1982-05-04

Roy, Upendra

Metal working

Method of mechanical manufacture

Assembling or joining

29571, 148 15, 148187, 357 65, 357 91, H01L 21263, H01L 21268, B05D 306

Patent

active

043274773

ABSTRACT:
Defects in the metal step coverage of a thin film semiconductor device are removed by annealing the metal layer with a pulsed electron beam.

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MaClean et al., J. Phys. D., Appl. Phys. 11 (1978), 999-1007.

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