Electron-beam and X-ray sensitive polymers and resists

Details Electron-beam and X-ray sensitive polymers and resists Electron-beam and X-ray sensitive polymers and resists

1984-03-12

1986-02-04

Henderson, Christopher A.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

430287, 526270, 526273, C08F 3800, C08F 2400

Patent

active

045687340

ABSTRACT:
There are disclosed polymers, E-beam sensitive elements and resists obtained therefrom, that are more sensitive than 5.times.10.sup.-7 coulombs per cm.sup.2 when exposed to a 15 keV electron beam. The polymers are copolymers of either allyl or propargyl methacrylate and of an acrylate or methacrylate bearing an oxygen-containing heterocyclic ring.

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patent: 4407895 (1983-10-01), Nakauchi

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