Electron-beam adhesion-promoting treatment of polyester film bas

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 35, 427129, 427322, B05D 306

Patent

active

045432686

ABSTRACT:
The magnetizable layer of a magnetic recording medium which has a flexible polyester film base is better adhered to the film base and better resists abrasion if the film base is first subjected to electron-beam irradiation while passing through an inert atmosphere such as nitrogen.

REFERENCES:
patent: 2863812 (1958-12-01), Graham
patent: 2940869 (1960-06-01), Graham
patent: 2955953 (1960-10-01), Graham
patent: 2997419 (1961-08-01), Lauton
patent: 3188229 (1965-06-01), Graham
patent: 3188266 (1965-06-01), Charbonneau et al.
patent: 3284331 (1966-11-01), McBride et al.
patent: 3607354 (1971-09-01), Krogh et al.
patent: 3628987 (1971-12-01), Nakata et al.
patent: 3783004 (1974-01-01), Parker
patent: 4128426 (1978-12-01), Ohta et al.
patent: 4140607 (1979-02-01), Kreiselmeier et al.
patent: 4210703 (1980-07-01), Scantlin et al.
Briggs, D., et al., "Surface Modification of Poly(ethylene terephthalate) by Electrical Discharge Treatment", Polymer, Aug. 1980, pp. 895-900.
Rand, W. M., Jr., "Electron Curing of Magnetic Coatings", Radiation Curing, Feb. 1983, pp. 26-31.

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