Electromigration verification method and apparatus

Details Electromigration verification method and apparatus Electromigration verification method and apparatus

1991-09-03

1995-04-25

Trans, Vincent N.

Boots, shoes, and leggings

G06F 1560

Patent

active

054104904

ABSTRACT:
A method of verifying the electromigration characteristics of a circuit is characterized by the following steps, to be performed for each net or node of the circuit: gathering data on the shapes of metal which compose the net; gathering data on the capacitance of the net; gathering data on the average frequency of the net; gathering data on the voltage swing of the net; computing the absolute value of the average current needed to charge and discharge the net; computing the minimum width of metal required for the met; and graphically indicating the location of any violations on artwork for the circuit.

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patent: 3683417 (1972-08-01), Gummel
patent: 4520448 (1985-05-01), Tremintin
patent: 5040134 (1991-08-01), Park
patent: 5049811 (1991-09-01), Dreyer et al.
"PANAMA P-B: A Mask Verification System for Bipolar IC" by Yoshida et al., IEEE 18th Design Automation Conference, 1981, pp. 690-695.
"EXCL: A Circuit Extractor for IC Designs" by McCormick, IEEE 21st Design Automation Conference, 1984, pp. 616-623.
"Resistance Extraction in a Hierarchical IC Artwork Verification System" by Mori et al., IEEE 1985, pp. 196-198.
"Analytical Power/Timing Optimization Technique for Digital System" by A. E. Ruehli et al., IEEE 14th Design Automation Conference, 1977, pp. 142-146.
"LAS: Layout Pattern Analysis System with New Approach" by Y. Okamura et al., IEEE 1982, pp. 308-311.
"Introduction to MOS LSI Design" by J. Mavor et al., Chapter 8: Analogue MOS Circuit, Addison-Wesley Publishers Limited, 1983, pp. 179-207.

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