Electromigration resistant metallization structures for microcir

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

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257763, 257764, 257915, H01L 23535, H01L 2943

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active

058216200

ABSTRACT:
Two metallization schemes of PtSi/TiW/TiW(N)/Au (Type I) and PtSi/TiW/TiW(N)/TiW/Au (Type II) and associated process are described for microcircuit interconnections. The metallization schemes and process are capable of IC-interconnections with a metal-pitch as small as 1.5 .mu.m, or even smaller. The metallization schemes are reliable for continuous high temperature and high current operations.

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