Electromigration method for making stained glass photomasks

Details Electromigration method for making stained glass photomasks Electromigration method for making stained glass photomasks

1977-11-30

1979-05-22

Bashore, S. Leon

Glass manufacturing

Processes

With chemically reactive treatment of glass preform

65 32, 65 60R, 65 60C, 204130, 427 12, 427 38, C03C 1500, C03C 1700

Patent

active

041557352

ABSTRACT:
Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photoresist on a sheet of glass and subsequently migrating stain-producing ions, such as silver and/or copper, into the surface of the glass under the influence of an electric field and moderately elevated temperatures.

REFERENCES:
patent: 2314804 (1943-03-01), Willson
patent: 2455719 (1948-12-01), Weyl et al.
patent: 2468402 (1949-04-01), Kreidl
patent: 2732298 (1956-01-01), Stookey
patent: 2904432 (1959-09-01), Ross et al.
patent: 2911749 (1959-11-01), Stookey
patent: 2927042 (1960-03-01), Hall et al.
patent: 3370948 (1968-02-01), Rosenbauer
patent: 3489624 (1970-01-01), Lake et al.
patent: 3508982 (1970-04-01), Shearin
patent: 3510371 (1970-05-01), Frankson
patent: 3515587 (1970-06-01), Letter
patent: 3528847 (1970-09-01), Grego et al.
patent: 3542612 (1970-11-01), Kashau et al.
patent: 3551304 (1970-12-01), Letter
patent: 3561963 (1971-02-01), Kiba
patent: 3573948 (1971-04-01), Tarnopol
patent: 3615318 (1971-10-01), Jagodzinski et al.
patent: 3620795 (1971-11-01), Kiba
patent: 3622295 (1971-11-01), Loukes et al.
patent: 3650720 (1972-03-01), Grego et al.
patent: 3653864 (1972-04-01), Rothermel et al.
patent: 3715244 (1973-02-01), Szupillo
patent: 3720515 (1973-03-01), Stanley
patent: 3732792 (1973-05-01), Tarnopol et al.
patent: 3754913 (1973-08-01), Takeuchi et al.
patent: 3811855 (1974-05-01), Carlson et al.
patent: 3816222 (1974-06-01), Plumat et al.
patent: 3817730 (1974-06-01), Uchida
patent: 3836348 (1974-09-01), Sumimoto et al.
patent: 3857689 (1974-12-01), Koizumi et al.
patent: 3879183 (1975-04-01), Carlson
patent: 3880630 (1975-04-01), Izawa
patent: 3896016 (1975-07-01), Goodman et al.
patent: 3902882 (1975-09-01), Loukes et al.
patent: 3905791 (1975-09-01), Plumat et al.
patent: 3905818 (1975-09-01), Margrain
patent: 3907566 (1975-09-01), Inoue et al.
patent: 3933609 (1976-01-01), Bokov
patent: 3960560 (1976-06-01), Sato
patent: 3967040 (1976-06-01), Plumat et al.
patent: 3991227 (1976-11-01), Carlson et al.
patent: 3991228 (1976-11-01), Carlson et al.
patent: 4017291 (1977-04-01), Gliemeruth
Reports, Research Lab., Asahi Glass Company, Ltd., 25-1-(1975), pp. 51-55.
Coloured Glasses, W. A. Weyl, Society of Glass Technology, 1951, pp. 409-419.
Research, 11 (1958), pp. 461-465, "Coloured Patterns In Glass", A. J. C. Hall, and J. G. Hayes, Annual Review of Materials Science, 1976, pp. 267-301.
Journal of Applied Physics, vol. 34, No. 6, Jun. 1963, "Oxygen Outgassing Caused by Electron Bombardment of Glass", J. L. Lineweaver.
Scientific American, Sep. 1977, pp. 111-128, "The Fabrication of Microelectronic Circuits", W. G. Oldham.

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