Electromagnetic radiation sensor and method of manufacture

Details Electromagnetic radiation sensor and method of manufacture Electromagnetic radiation sensor and method of manufacture

2009-01-07

2010-11-30

Kebede, Brook (Department: 2894)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C257S232000, C257SE27133

Reexamination Certificate

active

07842533

ABSTRACT:
A method of forming a semiconductor sensor in one embodiment includes providing a substrate, forming a reflective layer on the substrate, forming a sacrificial layer on the reflective layer, forming an absorber layer with a thickness of less than about 50 nm on the sacrificial layer, forming an absorber in the absorber layer integrally with at least one suspension leg, and removing the sacrificial layer.

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