Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-02-24
1995-10-17
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041823, 2041824, 2041825, B01D 6142, C25D 700, C25B 700, C25F 700
Patent
active
054587620
ABSTRACT:
The present invention relates to an electrolyzer for treating an object liquid. A cylindrical anode plate is formed as an outer wall of said electrolyzer and a cylindrical cathode plate is coaxially arranged at a position close to an inner surface of said anode plate. An ion exchange membrane is coaxially arranged between both electrodes to form an isolating chamber for a selective electrophoretic separation and removal and a concentration. A liquid, which has been subjected to an aimed treatment in said isolating chamber, is uniformly flown out from a whole circumference through a circumferential passage provided in an upper portion of an electrode portion. Thus, anions, which have acted upon metal cations, are dissociated in said isolating chamber to selectively separate merely cations. In addition, an improvement of the anode brought into contact with said object liquid in durability, a simplification of electrode surfaces in repair and processing, a uniformation of a current density, a handling of the liquid under the conditions corresponding to an operating object of the electrolyzer and the like can be achieved.
REFERENCES:
patent: 2593915 (1952-04-01), Pavelka
patent: 2739938 (1956-03-01), Wiechers
patent: 3764499 (1973-10-01), Okubo et al.
patent: 4105534 (1978-08-01), Beatty, III
patent: 4654137 (1987-03-01), Vaugham
patent: 4810344 (1989-03-01), Okazaki
patent: 4964970 (1990-10-01), O'Hare
Ishibashi Tadaya
Kano Hiroshi
Obara Hideto
Sasaki Masanori
Niebling John
Starsiak Jr. John S.
Unitika Ltd.
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