Electrolytic regeneration of acid cupric chloride etchant

Details Electrolytic regeneration of acid cupric chloride etchant Electrolytic regeneration of acid cupric chloride etchant

1993-12-01

1995-06-06

Niebling, John

Chemistry: electrical and wave energy

Processes and products

204106, 204130, 204228, 204DIG13, 204267, C25B 126

Patent

active

054219663

ABSTRACT:
An electrolytic apparatus and process for the on-line regeneration of acid cupric chloride etching baths used in printed circuit board fabrication is described. The apparatus utilizes a regeneration process which exactly reverses the reaction Cu+CuCl.sub.2 .fwdarw.2CuCl in order that the copper metal etched into the system is completely removed while at the same time maintaining the concentration of cuprous and cupric chloride within the desired range. A preferred system utilizes a flow-through graphite or carbon anode and a flow-by cathode, allowing for more precise control of current/potential variables. The cell utilizes low operating voltage resulting in less waste heat generation and lower electrical costs and improved on-line process control, leading to improved operating efficiencies and reliability in terms of unscheduled maintenance and outages.

REFERENCES:
patent: 2964453 (1960-12-01), Garn
patent: 4071429 (1978-01-01), Wagenknecht
patent: 4107011 (1978-08-01), Kucherenko
patent: 4468305 (1984-08-01), Hills
patent: 4604175 (1986-08-01), Navmov
patent: 4692228 (1987-09-01), Twardowski
patent: 5085730 (1992-02-01), Cordani
Louis H. Sharpe, Paul D. Garn, "Regenerable Etchant for Copper," Industrial and Engrg. Chem., vol. 51, No. 3, Mar. 1959.

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