Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate
2003-12-01
2008-10-28
Wilkins, III, Harry D (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Electrolytic
C204S225000
Reexamination Certificate
active
07442282
ABSTRACT:
An electrolytic processing apparatus according to an embodiment of the present invention includes: a substrate holder for holding a substrate; a first electrode to make contact with the substrate for passing electricity to a processing surface of the substrate; an electrode head including a high resistance structure and a second electrode, disposed opposite to and in this order from the substrate holder, and a polishing surface facing the processing surface of the substrate held by the substrate holder; an electrolytic solution injection portion for injecting an electrolytic solution between the processing surface of the substrate held by the substrate holder and the second electrode; a relative movement mechanism for moving the substrate holder and the electrode head relative to each other; a press mechanism for pressing the polishing surface of the electrode head against the substrate held by the substrate holder; and a power source for applying a voltage between the first electrode and the second electrode. The power source is capable of selectively switching the direction of electric current.
REFERENCES:
patent: 6176992 (2001-01-01), Talieh
patent: 6375823 (2002-04-01), Matsuda et al.
patent: 2001/0024691 (2001-09-01), Kimura et al.
patent: 2002/0130049 (2002-09-01), Chen et al.
Kunisawa Junji
Makino Natsuki
Ebara Corporation
Wenderoth , Lind & Ponack, L.L.P.
Wilkins, III Harry D
LandOfFree
Electrolytic processing apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrolytic processing apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrolytic processing apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4007517