Electrolytic plating apparatus for discrete microsized particles

Details Electrolytic plating apparatus for discrete microsized particles Electrolytic plating apparatus for discrete microsized particles

1975-09-11

1976-11-30

Tufariello, T. M.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204273, 204275, C25D 508, C25D 2110

Patent

active

039947963

ABSTRACT:
Method and apparatus are disclosed for electrolytically producing very uniform coatings of a desired material on discrete microsized particles. Agglomeration or bridging of the particles during the deposition process is prevented by imparting a sufficiently random motion to the particles that they are not in contact with a powered cathode for a time sufficient for such to occur.

REFERENCES:
patent: 1051556 (1913-01-01), Consigliere
patent: 3577324 (1971-05-01), Patterson
patent: 3654098 (1972-08-01), Backhurst
patent: 3703446 (1972-11-01), Haycock
patent: 3716459 (1973-02-01), Salter et al.
patent: 3941669 (1976-02-01), Bharucha
Lawrence Berkeley Laboratory Report LBL-3530 Inorganic Materials Research Division Annual Report 1974 pp. 151, 152, 174 and 175.

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