Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly alloy coating
Reexamination Certificate
2002-02-20
2010-11-16
Wong, Edna (Department: 1795)
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly alloy coating
C205S098000, C205S101000, C205S258000
Reexamination Certificate
active
07833404
ABSTRACT:
A method of forming a film composed of a phosphate compound and a metal on the surface of an article to be treated by performing electrolytic treatment on a metal article to be treated in a phosphate chemical treatment bath. The method includes contacting the metal article having electrical conductivity with the phosphate chemical treatment bath containing phosphate ions and phosphoric acid, nitrate ions, metal ions that form a complex with phosphate ions in the phosphate chemical treatment bath, and metal ions for which the dissolution-precipitation equilibrium potential at which ions dissolved in the phosphate chemical treatment bath are reduced and precipitate as metal is equal to or greater than −830 mV. The (oxidation-reduction potential) of the phosphate chemical treatment bath is maintained at equal to or greater than 700 mV.
REFERENCES:
patent: 4565585 (1986-01-01), Matsuda
patent: 5645706 (1997-07-01), Matsuda
patent: 6984300 (2006-01-01), Nishiya et al.
patent: 0 597 131 (1994-05-01), None
patent: 597131 (1994-05-01), None
patent: 1 074 640 (2001-02-01), None
patent: 1074640 (2001-02-01), None
patent: A 2000-234200 (2000-08-01), None
Matsuda Shigeki
Nishiya Shin
Denso Corporation
Oliff & Berridg,e PLC
Wong Edna
LandOfFree
Electrolytic phosphate chemical treatment method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrolytic phosphate chemical treatment method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrolytic phosphate chemical treatment method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4170720