Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1978-04-27
1979-01-23
Mack, John H.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
20412965, 20412975, C25F 314, C25F 500
Patent
active
041359895
ABSTRACT:
A method for etching tin oxide films from substrate materials is provided that includes the steps of forming an etching pattern layer of an active metal on the tin oxide film that is to be etched, contacting the active metal cathodically in an electrolytic solution, and subsequently contacting the active metal anodically in the electrolyte to thereby etch those portions of the tin oxide film that are covered by the etching pattern of active metal.
REFERENCES:
patent: 3205155 (1965-09-01), Van Natter
patent: 3507759 (1970-04-01), Shaw
patent: 3616349 (1971-10-01), Szupillo
E-Systems Inc.
Mack John H.
Valentine D. R.
Wilder Robert V.
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