Electrolytic etch preparation of semiconductor surfaces

Details Electrolytic etch preparation of semiconductor surfaces Electrolytic etch preparation of semiconductor surfaces

1978-03-08

1980-03-25

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20412975, C25F 312

Patent

active

041949544

ABSTRACT:
The surface of a semiconductor is prepared by electrolytically removing the surface of the semiconductor. A two component electrolyte is used. A first component forms an oxide on the surface of the semiconductor and the second component dissolves the oxide.

REFERENCES:
patent: 3010885 (1961-11-01), Schink
patent: 3798139 (1974-03-01), Schwartz
patent: 3929589 (1975-12-01), Ermanis et al.
patent: 4006047 (1977-02-01), Aboaf et al.
patent: 4026741 (1977-05-01), Chang et al.

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