Electrolyte solution for electrolytic metal plating

Details Electrolyte solution for electrolytic metal plating Electrolyte solution for electrolytic metal plating

1987-10-27

1988-10-18

Andrews, Richard L.

Chemistry: electrical and wave energy

Processes and products

204 431, 106 105, C25D 356

Patent

active

047785730

ABSTRACT:
An improved aqueous electrolyte solution suitable as an electrolytic plating bath is disclosed which is capable of giving a magnetic layer of a cobalt-based alloy on a substrate of a magnetic recording medium used in a high-density vertical-mode magnetization. The electrolyte solution characteristically contains, in addition to the conventional salts of cobalt, manganese and nickel, reducing agent and pH buffering and controlling agents, a water-soluble rhenium salt such as ammonium perrhenate in a concentration of 0.002 to 0.015 mole/liter.

REFERENCES:
patent: 4338215 (1982-07-01), Shaffer

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